2002 | "Encapsulating the electroluminescent phosphor micro-particles using a…
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작성자 관리자 / 작성일2015-08-24 / 조회958회첨부파일
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Title : Encapsulating the electroluminescent phosphor micro-particles using a pulsed metal-organic chemical vapor deposition process in a fluidized bed
Authors: Jimin Kim, Gui Young Han and Chan-Hwa Chung
Journal : Thin Solid Films
Vol/No/Page : 409/1/58-65
DOI : 10.1016/S0040-6090(02)00104-9
Abstract :
The protective coating efficiency of illuminated phosphor micro-particles has been investigated. The coating was performed by a pulsed feeding metal-organic chemical vapor deposition (MOCVD) in a fluidized bed using aluminum tri-sec-butylate or aluminum isopropoxide as a precursor. This pulsed MOCVD process in a fluidized bed shows excellent performance for encapsulating micro-particles. The pulsed feeding and the fluidization minimize the agglomeration between the phosphor micro-particles during the MOCVD process. Coating thickness is also precisely controlled up to the range of a few angstroms in thickness. Furthermore, by feeding the explosive aluminum MO precursor separately with oxygen gas, the coating process has been performed more safely in the pulsed MOCVD process.
Authors: Jimin Kim, Gui Young Han and Chan-Hwa Chung
Journal : Thin Solid Films
Vol/No/Page : 409/1/58-65
DOI : 10.1016/S0040-6090(02)00104-9
Abstract :
The protective coating efficiency of illuminated phosphor micro-particles has been investigated. The coating was performed by a pulsed feeding metal-organic chemical vapor deposition (MOCVD) in a fluidized bed using aluminum tri-sec-butylate or aluminum isopropoxide as a precursor. This pulsed MOCVD process in a fluidized bed shows excellent performance for encapsulating micro-particles. The pulsed feeding and the fluidization minimize the agglomeration between the phosphor micro-particles during the MOCVD process. Coating thickness is also precisely controlled up to the range of a few angstroms in thickness. Furthermore, by feeding the explosive aluminum MO precursor separately with oxygen gas, the coating process has been performed more safely in the pulsed MOCVD process.